Deposition of improved optically selective conductive tin oxide films by spray pyrolysis
Identifieur interne : 002402 ( Main/Exploration ); précédent : 002401; suivant : 002403Deposition of improved optically selective conductive tin oxide films by spray pyrolysis
Auteurs : I. S. Mulla [Inde] ; H. S. Soni [Inde] ; V. J. Rao [Inde] ; A. P. B. Sinha [Inde]Source :
- Journal of Materials Science [ 0022-2461 ] ; 1986-04-01.
English descriptors
- Teeft :
- Antimony, Antimony concentration, Appreciable change, Average transmission, Best combination, Better crystallinity, Blue coloration, Bragg angle, Conduction band, Critical temperature, Deposition, Deposition temperature, Doping, Electron diffraction pattern, Film decreases, Film thickness, Free carriers, Further increase, Glass substrate, Good selectivity, High carrier concentration, Higher antimony doping, Ibid, Infrared reflectance, Infrared reflectivity, Inverse temperature, Irreversible decrease, Lower resistivity, Lowest resistivity, Moisture content, Optical properties, Oxide films, Phys, Plasma edge, Present film, Reflectance, Reflectivity, Resistivity, Sno2, Sno2 film, Sno2 films, Sno2 structure, Spray pyrolysis, Such films, Temperature range, Various antimony concentrations, Visible region.
Abstract
Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.
Url:
DOI: 10.1007/BF00553263
Affiliations:
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<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title><author><name sortKey="Mulla, I S" sort="Mulla, I S" uniqKey="Mulla I" first="I. S." last="Mulla">I. S. Mulla</name></author><author><name sortKey="Soni, H S" sort="Soni, H S" uniqKey="Soni H" first="H. S." last="Soni">H. S. Soni</name></author><author><name sortKey="Rao, V J" sort="Rao, V J" uniqKey="Rao V" first="V. J." last="Rao">V. J. Rao</name></author><author><name sortKey="Sinha, A P B" sort="Sinha, A P B" uniqKey="Sinha A" first="A. P. B." last="Sinha">A. P. B. Sinha</name></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:D055AE3FBF398EA63DF4B893410746645C3CDD6E</idno><date when="1986" year="1986">1986</date><idno type="doi">10.1007/BF00553263</idno><idno type="url">https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/fulltext.pdf</idno><idno type="wicri:Area/Istex/Corpus">000D72</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000D72</idno><idno type="wicri:Area/Istex/Curation">000D72</idno><idno type="wicri:Area/Istex/Checkpoint">001094</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Checkpoint">001094</idno><idno type="wicri:doubleKey">0022-2461:1986:Mulla I:deposition:of:improved</idno><idno type="wicri:Area/Main/Merge">002518</idno><idno type="wicri:Area/Main/Curation">002402</idno><idno type="wicri:Area/Main/Exploration">002402</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title><author><name sortKey="Mulla, I S" sort="Mulla, I S" uniqKey="Mulla I" first="I. S." last="Mulla">I. S. Mulla</name><affiliation wicri:level="1"><country xml:lang="fr">Inde</country><wicri:regionArea>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona</wicri:regionArea><wicri:noRegion>Poona</wicri:noRegion></affiliation></author><author><name sortKey="Soni, H S" sort="Soni, H S" uniqKey="Soni H" first="H. S." last="Soni">H. S. Soni</name><affiliation wicri:level="1"><country xml:lang="fr">Inde</country><wicri:regionArea>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona</wicri:regionArea><wicri:noRegion>Poona</wicri:noRegion></affiliation></author><author><name sortKey="Rao, V J" sort="Rao, V J" uniqKey="Rao V" first="V. J." last="Rao">V. J. Rao</name><affiliation wicri:level="1"><country xml:lang="fr">Inde</country><wicri:regionArea>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona</wicri:regionArea><wicri:noRegion>Poona</wicri:noRegion></affiliation></author><author><name sortKey="Sinha, A P B" sort="Sinha, A P B" uniqKey="Sinha A" first="A. P. B." last="Sinha">A. P. B. Sinha</name><affiliation wicri:level="1"><country xml:lang="fr">Inde</country><wicri:regionArea>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona</wicri:regionArea><wicri:noRegion>Poona</wicri:noRegion></affiliation></author></analytic><monogr></monogr><series><title level="j">Journal of Materials Science</title><title level="j" type="abbrev">J Mater Sci</title><idno type="ISSN">0022-2461</idno><idno type="eISSN">1573-4803</idno><imprint><publisher>Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><date type="published" when="1986-04-01">1986-04-01</date><biblScope unit="volume">21</biblScope><biblScope unit="issue">4</biblScope><biblScope unit="page" from="1280">1280</biblScope><biblScope unit="page" to="1288">1288</biblScope></imprint><idno type="ISSN">0022-2461</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0022-2461</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="Teeft" xml:lang="en"><term>Antimony</term><term>Antimony concentration</term><term>Appreciable change</term><term>Average transmission</term><term>Best combination</term><term>Better crystallinity</term><term>Blue coloration</term><term>Bragg angle</term><term>Conduction band</term><term>Critical temperature</term><term>Deposition</term><term>Deposition temperature</term><term>Doping</term><term>Electron diffraction pattern</term><term>Film decreases</term><term>Film thickness</term><term>Free carriers</term><term>Further increase</term><term>Glass substrate</term><term>Good selectivity</term><term>High carrier concentration</term><term>Higher antimony doping</term><term>Ibid</term><term>Infrared reflectance</term><term>Infrared reflectivity</term><term>Inverse temperature</term><term>Irreversible decrease</term><term>Lower resistivity</term><term>Lowest resistivity</term><term>Moisture content</term><term>Optical properties</term><term>Oxide films</term><term>Phys</term><term>Plasma edge</term><term>Present film</term><term>Reflectance</term><term>Reflectivity</term><term>Resistivity</term><term>Sno2</term><term>Sno2 film</term><term>Sno2 films</term><term>Sno2 structure</term><term>Spray pyrolysis</term><term>Such films</term><term>Temperature range</term><term>Various antimony concentrations</term><term>Visible region</term></keywords></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.</div></front></TEI><affiliations><list><country><li>Inde</li></country></list><tree><country name="Inde"><noRegion><name sortKey="Mulla, I S" sort="Mulla, I S" uniqKey="Mulla I" first="I. S." last="Mulla">I. S. Mulla</name></noRegion><name sortKey="Rao, V J" sort="Rao, V J" uniqKey="Rao V" first="V. J." last="Rao">V. J. Rao</name><name sortKey="Sinha, A P B" sort="Sinha, A P B" uniqKey="Sinha A" first="A. P. B." last="Sinha">A. P. B. Sinha</name><name sortKey="Soni, H S" sort="Soni, H S" uniqKey="Soni H" first="H. S." last="Soni">H. S. Soni</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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